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等(deng)離子拋(pao)(pao)(pao)(pao)光(guang)(guang)機(ji)作為(wei)新一代表面(mian)處理設備,其(qi)節(jie)能(neng)(neng)(neng),主要體(ti)現(xian)在(zai)以下(xia)三(san)個方面(mian):###一、電(dian)能(neng)(neng)(neng)轉(zhuan)化(hua)與(yu)時間壓縮(suo)(suo)等(deng)離子拋(pao)(pao)(pao)(pao)光(guang)(guang)通過高(gao)頻電(dian)場激發電(dian)解液產生(sheng)低溫(wen)等(deng)離子體(ti),全自(zi)(zi)動(dong)(dong)拋(pao)(pao)(pao)(pao)光(guang)(guang)機(ji)批發,直接作用(yong)(yong)于金(jin)(jin)屬(shu)表面(mian),實(shi)(shi)(shi)現(xian)分(fen)子級拋(pao)(pao)(pao)(pao)光(guang)(guang)。該技(ji)術(shu)(shu)將80%以上的(de)(de)電(dian)能(neng)(neng)(neng)轉(zhuan)化(hua)為(wei)有(you)效(xiao)化(hua)學(xue)能(neng)(neng)(neng),而(er)傳(chuan)(chuan)統機(ji)械拋(pao)(pao)(pao)(pao)光(guang)(guang)電(dian)機(ji)能(neng)(neng)(neng)耗(hao)中僅30%-40%轉(zhuan)化(hua)為(wei)有(you)效(xiao)動(dong)(dong)能(neng)(neng)(neng)。單次(ci)加工(gong)時間縮(suo)(suo)短(duan)至(zhi)傳(chuan)(chuan)統工(gong)藝(yi)的(de)(de)1/3-1/2,全自(zi)(zi)動(dong)(dong)拋(pao)(pao)(pao)(pao)光(guang)(guang)機(ji),例如不(bu)銹(xiu)鋼拋(pao)(pao)(pao)(pao)光(guang)(guang)從60分(fen)鐘降至(zhi)15-20分(fen)鐘,單位能(neng)(neng)(neng)耗(hao)降低40%-60%。###二、低熱損耗(hao)與(yu)輔助(zhu)系(xi)統優(you)(you)化(hua)工(gong)作溫(wen)度控制(zhi)(zhi)在(zai)50-80℃區(qu)間,相較(jiao)化(hua)學(xue)拋(pao)(pao)(pao)(pao)光(guang)(guang)的(de)(de)100-120℃高(gao)溫(wen)環境,熱能(neng)(neng)(neng)損耗(hao)降低70%。集成式冷(leng)卻系(xi)統功耗(hao)僅為(wei)傳(chuan)(chuan)統水冷(leng)設備的(de)(de)1/5,配合(he)智能(neng)(neng)(neng)溫(wen)控模塊(kuai),額外節(jie)能(neng)(neng)(neng)15%。某(mou)汽(qi)車零部(bu)件企業(ye)實(shi)(shi)(shi)測數據(ju)顯示(shi),全自(zi)(zi)動(dong)(dong)拋(pao)(pao)(pao)(pao)光(guang)(guang)機(ji)廠家,年(nian)節(jie)約制(zhi)(zhi)冷(leng)用(yong)(yong)電(dian)量達(da)32萬kWh。###三(san)、材(cai)料循(xun)環與(yu)綜(zong)(zong)合(he)能(neng)(neng)(neng)效(xiao)提升采用(yong)(yong)封閉式循(xun)環系(xi)統,電(dian)解液利用(yong)(yong)率(lv)達(da)95%以上,較(jiao)開放式化(hua)學(xue)拋(pao)(pao)(pao)(pao)光(guang)(guang)減少原(yuan)料損耗(hao)60%。金(jin)(jin)屬(shu)去(qu)除率(lv)控制(zhi)(zhi)在(zai)0.5-2μm/分(fen)鐘,材(cai)料浪費減少40%。某(mou)3C電(dian)子制(zhi)(zhi)造案例顯示(shi),綜(zong)(zong)合(he)能(neng)(neng)(neng)耗(hao)成本(ben)從傳(chuan)(chuan)統工(gong)藝(yi)的(de)(de)2.8元/m2降至(zhi)0.9元/m2。該設備還通過物聯網平臺(tai)實(shi)(shi)(shi)現(xian)能(neng)(neng)(neng)耗(hao)動(dong)(dong)態(tai)監控,可自(zi)(zi)動(dong)(dong)調節(jie)功率(lv)輸出(chu),在(zai)待機(ji)狀態(tai)下(xia)功耗(hao)低于額定(ding)功率(lv)的(de)(de)5%。實(shi)(shi)(shi)際應用(yong)(yong)數據(ju)顯示(shi),綜(zong)(zong)合(he)節(jie)能(neng)(neng)(neng)效(xiao)益使企業(ye)表面(mian)處理工(gong)序(xu)的(de)(de)碳排放量降低55%,契合(he)歐盟CE能(neng)(neng)(neng)效(xiao)標準,投資(zi)回(hui)收周(zhou)期縮(suo)(suo)短(duan)至(zhi)1.5-2年(nian)。這種節(jie)能(neng)(neng)(neng)優(you)(you)勢在(zai)鋁合(he)金(jin)(jin)、鈦合(he)金(jin)(jin)等(deng)難加工(gong)材(cai)料領域尤為(wei)突出(chu),為(wei)制(zhi)(zhi)造業(ye)綠色(se)轉(zhuan)型提供了(le)關(guan)鍵技(ji)術(shu)(shu)支(zhi)撐。
等離子拋光是一種的技術等(deng)(deng)離(li)(li)(li)子(zi)(zi)拋(pao)光(guang)(guang)(guang)(guang)(PlasmaPolishing)是一種(zhong)(zhong)基(ji)于低(di)溫等(deng)(deng)離(li)(li)(li)子(zi)(zi)體(ti)(ti)(ti)技(ji)術(shu)的(de)(de)精(jing)密表面處(chu)理(li)工(gong)(gong)(gong)藝,其(qi)原理(li)是利用電離(li)(li)(li)氣(qi)(qi)體(ti)(ti)(ti)產生的(de)(de)活性(xing)粒子(zi)(zi)對材料表面進(jin)行原子(zi)(zi)級去除(chu),實現(xian)亞微米級精(jing)度(du)的(de)(de)超(chao)光(guang)(guang)(guang)(guang)滑表面加工(gong)(gong)(gong)。與(yu)傳(chuan)統機(ji)械或化學拋(pao)光(guang)(guang)(guang)(guang)相比(bi),該技(ji)術(shu)通過控制(zhi)等(deng)(deng)離(li)(li)(li)子(zi)(zi)體(ti)(ti)(ti)中的(de)(de)高能(neng)(neng)(neng)粒子(zi)(zi)(如(ru)電子(zi)(zi)、離(li)(li)(li)子(zi)(zi)、自由基(ji))與(yu)工(gong)(gong)(gong)件(jian)(jian)表面的(de)(de)物理(li)轟擊(ji)和(he)化學反應(ying),可(ke)在不改變材料基(ji)體(ti)(ti)(ti)性(xing)能(neng)(neng)(neng)的(de)(de)前提下,有效消除(chu)表面微觀缺(que)陷。在真空(kong)或低(di)壓(ya)環境(jing)中,工(gong)(gong)(gong)作氣(qi)(qi)體(ti)(ti)(ti)(常用氣(qi)(qi)、氧氣(qi)(qi)或混合(he)氣(qi)(qi)體(ti)(ti)(ti))經高頻電場電離(li)(li)(li)形成(cheng)(cheng)等(deng)(deng)離(li)(li)(li)子(zi)(zi)體(ti)(ti)(ti),其(qi)中帶(dai)電粒子(zi)(zi)以(yi)定(ding)向動能(neng)(neng)(neng)撞擊(ji)工(gong)(gong)(gong)件(jian)(jian)表面,選擇性(xing)去除(chu)凸起部位的(de)(de)原子(zi)(zi)層。這種(zhong)(zhong)非接觸式加工(gong)(gong)(gong)方(fang)式特別適(shi)用于復雜(za)幾(ji)何結(jie)構(如(ru)微孔(kong)、內腔(qiang)、異形曲(qu)面)的(de)(de)拋(pao)光(guang)(guang)(guang)(guang),全自動拋(pao)光(guang)(guang)(guang)(guang)機(ji)價格,處(chu)理(li)精(jing)度(du)可(ke)達Ra0.01μm,且能(neng)(neng)(neng)保持工(gong)(gong)(gong)件(jian)(jian)原有尺寸(cun)精(jing)度(du)。目前該技(ji)術(shu)已在航(hang)空(kong)航(hang)天發動機(ji)葉片、(如(ru)人工(gong)(gong)(gong)關節)、光(guang)(guang)(guang)(guang)學鏡片及(ji)半導(dao)體(ti)(ti)(ti)晶圓等(deng)(deng)制(zhi)造(zao)(zao)領域獲得應(ying)用。等(deng)(deng)離(li)(li)(li)子(zi)(zi)拋(pao)光(guang)(guang)(guang)(guang)的(de)(de)優勢體(ti)(ti)(ti)現(xian)在環保性(xing)和(he)普(pu)適(shi)性(xing):處(chu)理(li)過程(cheng)無需化學拋(pao)光(guang)(guang)(guang)(guang)液(ye),廢棄物接近零排放,符合(he)綠色制(zhi)造(zao)(zao)標準;可(ke)處(chu)理(li)不銹鋼、鈦合(he)金(jin)、陶瓷等(deng)(deng)多種(zhong)(zhong)材料,尤其(qi)擅(shan)長(chang)處(chu)理(li)傳(chuan)統方(fang)法易導(dao)致變形的(de)(de)超(chao)薄(bo)件(jian)(jian)(厚度(du)0.1mm)。盡(jin)管設備(bei)初期投資較(jiao)高(單臺(tai)設備(bei)約200-500萬元),但其(qi)加工(gong)(gong)(gong)效率較(jiao)傳(chuan)統工(gong)(gong)(gong)藝提升3-5倍,且能(neng)(neng)(neng)顯著(zhu)延長(chang)工(gong)(gong)(gong)件(jian)(jian)疲勞壽命。隨著(zhu)精(jing)密制(zhi)造(zao)(zao)向納米級精(jing)度(du)發展,等(deng)(deng)離(li)(li)(li)子(zi)(zi)拋(pao)光(guang)(guang)(guang)(guang)與(yu)智能(neng)(neng)(neng)控制(zhi)系統、原位檢測技(ji)術(shu)的(de)(de)融合(he),正(zheng)推動該技(ji)術(shu)向智能(neng)(neng)(neng)化、模塊化方(fang)向演進(jin),成(cheng)(cheng)為(wei)裝備(bei)制(zhi)造(zao)(zao)的(de)(de)革新性(xing)表面處(chu)理(li)方(fang)案。
等(deng)(deng)(deng)離(li)(li)子(zi)(zi)拋光(guang)機(ji)(ji)的(de)結(jie)構組(zu)成(cheng)(cheng)(約450字(zi))等(deng)(deng)(deng)離(li)(li)子(zi)(zi)拋光(guang)機(ji)(ji)是一種利用(yong)低溫等(deng)(deng)(deng)離(li)(li)子(zi)(zi)體(ti)技(ji)術實現表面(mian)處理的(de)精密設(she)備(bei)(bei),其結(jie)構由(you)七大(da)系(xi)(xi)(xi)(xi)統(tong)(tong)(tong)組(zu)成(cheng)(cheng):1.高頻(pin)電(dian)(dian)(dian)(dian)源(yuan)(yuan)系(xi)(xi)(xi)(xi)統(tong)(tong)(tong)作(zuo)為(wei)(wei)設(she)備(bei)(bei)的(de)動(dong)(dong)(dong)力源(yuan)(yuan),采用(yong)高頻(pin)逆變技(ji)術(通常為(wei)(wei)20-100kHz),可輸出(chu)(chu)10-50kV的(de)高壓電(dian)(dian)(dian)(dian)場。電(dian)(dian)(dian)(dian)源(yuan)(yuan)系(xi)(xi)(xi)(xi)統(tong)(tong)(tong)配(pei)(pei)備(bei)(bei)智能(neng)調(diao)節模(mo)(mo)塊(kuai),能(neng)根據工(gong)(gong)(gong)(gong)藝(yi)需求自(zi)動(dong)(dong)(dong)調(diao)整輸出(chu)(chu)參數,確(que)保等(deng)(deng)(deng)離(li)(li)子(zi)(zi)體(ti)穩定生成(cheng)(cheng)。主(zhu)要包(bao)含(han)整流(liu)單元、逆變單元和升壓變壓器(qi)等(deng)(deng)(deng)組(zu)件(jian)。2.等(deng)(deng)(deng)離(li)(li)子(zi)(zi)發生器(qi)由(you)特殊合(he)金電(dian)(dian)(dian)(dian)極(ji)和陶瓷介(jie)質(zhi)管(guan)構成(cheng)(cheng)放電(dian)(dian)(dian)(dian)腔(qiang)體(ti),通過(guo)高壓擊穿工(gong)(gong)(gong)(gong)藝(yi)氣(qi)(qi)體(ti)形成(cheng)(cheng)等(deng)(deng)(deng)離(li)(li)子(zi)(zi)體(ti)束。關鍵(jian)部件(jian)包(bao)括(kuo):-鎢銅合(he)金主(zhu)電(dian)(dian)(dian)(dian)極(ji)-多層陶瓷絕緣介(jie)質(zhi)管(guan)-氣(qi)(qi)體(ti)分(fen)配(pei)(pei)環-等(deng)(deng)(deng)離(li)(li)子(zi)(zi)噴嘴組(zu)件(jian)3.真空工(gong)(gong)(gong)(gong)作(zuo)腔(qiang)室采用(yong)316L不銹鋼制(zhi)(zhi)造的(de)雙(shuang)層水(shui)冷腔(qiang)體(ti),配(pei)(pei)備(bei)(bei)石英觀察窗和自(zi)動(dong)(dong)(dong)門(men)鎖(suo)系(xi)(xi)(xi)(xi)統(tong)(tong)(tong)。腔(qiang)室容積(ji)根據型號不同在(zai)20-200L間變化(hua),內部配(pei)(pei)置可旋(xuan)轉(zhuan)工(gong)(gong)(gong)(gong)裝夾具(ju)(轉(zhuan)速(su)0-50rpm可調(diao)),并(bing)集成(cheng)(cheng)溫度(du)傳感器(qi)和壓力傳感器(qi)。4.氣(qi)(qi)體(ti)供應(ying)系(xi)(xi)(xi)(xi)統(tong)(tong)(tong)包(bao)含(han)氣(qi)(qi)體(ti)混合(he)裝置、質(zhi)量(liang)流(liu)量(liang)控(kong)(kong)(kong)制(zhi)(zhi)器(qi)(MFC)和廢(fei)氣(qi)(qi)處理單元。典型配(pei)(pei)置為(wei)(wei)氣(qi)(qi)(主(zhu)氣(qi)(qi)源(yuan)(yuan))+氧氣(qi)(qi)/氮(dan)氣(qi)(qi)(反應(ying)氣(qi)(qi)體(ti))雙(shuang)路供氣(qi)(qi)系(xi)(xi)(xi)(xi)統(tong)(tong)(tong),氣(qi)(qi)體(ti)純(chun)度(du)要求達到99.999%,流(liu)量(liang)控(kong)(kong)(kong)制(zhi)(zhi)精度(du)±1%FS。5.循環冷卻系(xi)(xi)(xi)(xi)統(tong)(tong)(tong)由(you)板式換熱器(qi)、循環泵(beng)和溫度(du)控(kong)(kong)(kong)制(zhi)(zhi)單元組(zu)成(cheng)(cheng),采用(yong)去離(li)(li)子(zi)(zi)水(shui)作(zuo)為(wei)(wei)冷卻介(jie)質(zhi),維持電(dian)(dian)(dian)(dian)極(ji)溫度(du)在(zai)15-25℃。冷卻功率根據機(ji)(ji)型不同在(zai)5-30kW之間,配(pei)(pei)備(bei)(bei)漏水(shui)檢(jian)測(ce)(ce)和流(liu)量(liang)報(bao)警裝置。6.運(yun)動(dong)(dong)(dong)控(kong)(kong)(kong)制(zhi)(zhi)系(xi)(xi)(xi)(xi)統(tong)(tong)(tong)包(bao)含(han)三軸機(ji)(ji)械(xie)臂(定位精度(du)±0.05mm)、旋(xuan)轉(zhuan)工(gong)(gong)(gong)(gong)作(zuo)臺和視覺定位系(xi)(xi)(xi)(xi)統(tong)(tong)(tong)。伺服電(dian)(dian)(dian)(dian)機(ji)(ji)驅動(dong)(dong)(dong),搭配(pei)(pei)行星減速(su)機(ji)(ji),實現復雜曲(qu)面(mian)工(gong)(gong)(gong)(gong)件(jian)的(de)自(zi)動(dong)(dong)(dong)拋光(guang)。運(yun)動(dong)(dong)(dong)軌(gui)跡可通過(guo)PLC或工(gong)(gong)(gong)(gong)業(ye)PC編程控(kong)(kong)(kong)制(zhi)(zhi)。7.監測(ce)(ce)與安全(quan)(quan)系(xi)(xi)(xi)(xi)統(tong)(tong)(tong)集成(cheng)(cheng)等(deng)(deng)(deng)離(li)(li)子(zi)(zi)體(ti)光(guang)譜分(fen)析儀(波長范圍200-1000nm)、表面(mian)測(ce)(ce)溫儀(精度(du)±2℃)和殘余氣(qi)(qi)體(ti)分(fen)析儀。安全(quan)(quan)防護包(bao)括(kuo)雙(shuang)重門(men)聯鎖(suo)、過(guo)壓保護、電(dian)(dian)(dian)(dian)弧檢(jian)測(ce)(ce)和緊(jin)急(ji)停機(ji)(ji)裝置,符合(he)CE安全(quan)(quan)標準。輔助系(xi)(xi)(xi)(xi)統(tong)(tong)(tong)包(bao)含(han)工(gong)(gong)(gong)(gong)藝(yi)數據庫管(guan)理模(mo)(mo)塊(kuai)、廢(fei)氣(qi)(qi)凈化(hua)塔(活(huo)性(xing)炭+HEPA過(guo)濾)和去離(li)(li)子(zi)(zi)水(shui)制(zhi)(zhi)備(bei)(bei)裝置。整機(ji)(ji)采用(yong)模(mo)(mo)塊(kuai)化(hua)設(she)計,各系(xi)(xi)(xi)(xi)統(tong)(tong)(tong)通過(guo)工(gong)(gong)(gong)(gong)業(ye)總線互(hu)聯,支持遠程監控(kong)(kong)(kong)和工(gong)(gong)(gong)(gong)藝(yi)參數云端(duan)存(cun)儲。
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