首(shou)飾(shi)品(pin)等(deng)(deng)離(li)(li)子拋光機使(shi)用(yong)(yong)指南一、準(zhun)備(bei)(bei)工(gong)作(zuo)(zuo)1.設備(bei)(bei)檢查：確認(ren)拋光機電(dian)(dian)(dian)(dian)(dian)源線無破損，電(dian)(dian)(dian)(dian)(dian)解槽(cao)無滲漏(lou)，電(dian)(dian)(dian)(dian)(dian)極片(pian)(pian)表面(mian)清(qing)潔無氧化(hua)層。2.材料準(zhun)備(bei)(bei)：配(pei)置電(dian)(dian)(dian)(dian)(dian)解液(ye)（建議(yi)濃度(du)5-15%），準(zhun)備(bei)(bei)去離(li)(li)子水(shui)、防銹劑(ji)及配(pei)套(tao)夾(jia)(jia)具。建議(yi)準(zhun)備(bei)(bei)測(ce)試用(yong)(yong)廢舊首(shou)飾(shi)進行(xing)參數(shu)調試。二、操作(zuo)(zuo)流(liu)程（1）首(shou)飾(shi)預處(chu)理(li)-使(shi)用(yong)(yong)超聲(sheng)波(bo)清(qing)洗(xi)(xi)機去除首(shou)飾(shi)表面(mian)油污(wu)（建議(yi)溫(wen)(wen)度(du)40℃清(qing)洗(xi)(xi)3-5分(fen)鐘(zhong)）-對(dui)復雜紋飾(shi)首(shou)飾(shi)需(xu)用(yong)(yong)軟毛(mao)刷輔助清(qing)潔-銅/銀制(zhi)品(pin)需(xu)預先化(hua)學(xue)除氧化(hua)層（2）設備(bei)(bei)設置1.倒入(ru)電(dian)(dian)(dian)(dian)(dian)解液(ye)至標準(zhun)液(ye)位(wei)線（液(ye)面(mian)需(xu)完全覆蓋電(dian)(dian)(dian)(dian)(dian)極片(pian)(pian)）2.設置參數(shu)：-電(dian)(dian)(dian)(dian)(dian)壓：小型(xing)(xing)首(shou)飾(shi)（耳釘等(deng)(deng)）15-20V-中型(xing)(xing)首(shou)飾(shi)（戒指）20-25V-大型(xing)(xing)件（手鐲）25-35V3.溫(wen)(wen)度(du)設定不超過(guo)50℃，時(shi)間(jian)控制(zhi)在30秒-3分(fen)鐘(zhong)（視材質(zhi)調整）（3）拋光操作(zuo)(zuo)1.使(shi)用(yong)(yong)鈦合(he)金夾(jia)(jia)具夾(jia)(jia)持首(shou)飾(shi)浸入(ru)電(dian)(dian)(dian)(dian)(dian)解液(ye)（注(zhu)意避(bi)免觸碰電(dian)(dian)(dian)(dian)(dian)極）2.啟(qi)動設備(bei)(bei)后觀察等(deng)(deng)離(li)(li)子體均勻包裹首(shou)飾(shi)表面(mian)3.復雜造(zao)型(xing)(xing)首(shou)飾(shi)需(xu)每30秒調整夾(jia)(jia)持角度(du)三(san)、注(zhu)意事項1.安全防護(hu)：必須佩戴防濺(jian)射護(hu)目鏡及絕緣手套(tao)2.材質(zhi)限制(zhi)：不適用(yong)(yong)于(yu)鍍層首(shou)飾(shi)（易剝離(li)(li)）及多孔結構(gou)銀飾(shi)3.電(dian)(dian)(dian)(dian)(dian)解液(ye)管(guan)理(li)：每8小時(shi)需(xu)過(guo)濾雜質(zhi)，PH值維持在8.5-9.54.異常處(chu)理(li)：出現劇(ju)烈氣泡立即斷電(dian)(dian)(dian)(dian)(dian)，等(deng)(deng)離(li)(li)子拋光設備(bei)(bei)廠家，檢查電(dian)(dian)(dian)(dian)(dian)極間(jian)距（標準(zhun)3-5mm）四、后處(chu)理(li)1.取出后立即用(yong)(yong)去離(li)(li)子水(shui)沖洗(xi)(xi)（建議(yi)三(san)級逆流(liu)漂洗(xi)(xi)）2.銅制(zhi)品(pin)需(xu)浸入(ru)0.5%苯并三(san)氮唑防銹液(ye)3.使(shi)用(yong)(yong)60℃熱風烘干避(bi)免水(shui)漬殘留建議(yi)使(shi)用(yong)(yong)前(qian)進行(xing)材質(zhi)適配(pei)測(ce)試，不同金屬（如925銀、316L鋼）需(xu)調整電(dian)(dian)(dian)(dian)(dian)壓參數(shu)。定期清(qing)理(li)電(dian)(dian)(dian)(dian)(dian)解槽(cao)底部沉淀物（建議(yi)每40小時(shi)清(qing)理(li)），等(deng)(deng)離(li)(li)子拋光設備(bei)(bei)，電(dian)(dian)(dian)(dian)(dian)極片(pian)(pian)每月需(xu)用(yong)(yong)10%稀鹽酸活(huo)化(hua)處(chu)理(li)。掌握好'低電(dian)(dian)(dian)(dian)(dian)壓多次(ci)拋光'原則，可(ke)有效避(bi)免首(shou)飾(shi)棱角過(guo)蝕(shi)問題(ti)。

等(deng)(deng)離(li)子(zi)(zi)(zi)電(dian)(dian)漿(jiang)拋光(guang)機(ji)是一種基于(yu)低(di)溫(wen)等(deng)(deng)離(li)子(zi)(zi)(zi)體(ti)(ti)技(ji)術的(de)精密表面處(chu)理(li)(li)設備(bei)，通(tong)(tong)過(guo)電(dian)(dian)離(li)氣(qi)體(ti)(ti)產生的(de)活性(xing)粒(li)子(zi)(zi)(zi)實現材(cai)料(liao)表面的(de)超(chao)精細(xi)加工(gong)。其原理(li)(li)是在真(zhen)空環境下，利用高(gao)(gao)頻電(dian)(dian)場(chang)將(jiang)惰性(xing)氣(qi)體(ti)(ti)（如氣(qi)）電(dian)(dian)離(li)為等(deng)(deng)離(li)子(zi)(zi)(zi)態(tai)，形成(cheng)高(gao)(gao)能(neng)電(dian)(dian)子(zi)(zi)(zi)、離(li)子(zi)(zi)(zi)和(he)(he)自由基的(de)混合體(ti)(ti)。這些高(gao)(gao)活性(xing)粒(li)子(zi)(zi)(zi)以(yi)物理(li)(li)轟擊與化學(xue)蝕刻協(xie)同作用，逐(zhu)層(ceng)剝(bo)離(li)材(cai)料(liao)表面納米級凸起，達(da)到原子(zi)(zi)(zi)級平(ping)整效果。工(gong)藝流程分(fen)為四個階段：首行預處(chu)理(li)(li)，通(tong)(tong)過(guo)超(chao)聲波清洗去除(chu)工(gong)件表面油脂與顆粒(li)；隨后在真(zhen)空腔體(ti)(ti)內通(tong)(tong)入(ru)工(gong)藝氣(qi)體(ti)(ti)，施加射頻電(dian)(dian)源激(ji)發(fa)穩(wen)定等(deng)(deng)離(li)子(zi)(zi)(zi)體(ti)(ti)；接(jie)著(zhu)通(tong)(tong)過(guo)控(kong)制(zhi)氣(qi)體(ti)(ti)流量(liang)、功率(lv)及處(chu)理(li)(li)時(shi)間（通(tong)(tong)常為5-30分(fen)鐘(zhong)），實現0.1-1μm的(de)材(cai)料(liao)去除(chu)量(liang)；進(jin)行惰性(xing)氣(qi)體(ti)(ti)保護冷(leng)卻，避(bi)免二次氧化。關鍵參數包括工(gong)作壓力(li)（10-100Pa）、射頻頻率(lv)（13.56MHz或2.45GHz）及溫(wen)度控(kong)制(zhi)（50-200℃）。該技(ji)術主要應(ying)用于(yu)航空航天精密部(bu)件、半(ban)導體(ti)(ti)晶(jing)圓(yuan)、植入(ru)體(ti)(ti)及光(guang)學(xue)鏡片等(deng)(deng)領域，鋅合金(jin)等(deng)(deng)離(li)子(zi)(zi)(zi)拋光(guang)設備(bei)，尤其擅長處(chu)理(li)(li)不銹(xiu)鋼、鈦(tai)合金(jin)等(deng)(deng)難加工(gong)材(cai)料(liao)。相較于(yu)傳統拋光(guang)，其優勢顯著(zhu)：非接(jie)觸(chu)式加工(gong)消除(chu)機(ji)械應(ying)力(li)，可處(chu)理(li)(li)復雜(za)微(wei)結構；表面粗(cu)糙度可達(da)Ra≤0.01μm，且無化學(xue)殘留(liu)；能(neng)耗降低(di)40%以(yi)上，廢(fei)棄物排放減少90%。隨著(zhu)5G精密零部(bu)件和(he)(he)微(wei)型(xing)需求增長，等(deng)(deng)離(li)子(zi)(zi)(zi)拋光(guang)正(zheng)逐(zhu)步成(cheng)為制(zhi)造領域的(de)關鍵表面處(chu)理(li)(li)技(ji)術。

等(deng)(deng)(deng)離(li)(li)子(zi)拋光(guang)(guang)機主(zhu)要用(yong)(yong)于對多種材質（如金屬、陶瓷和(he)玻璃(li)等(deng)(deng)(deng)）的(de)(de)(de)(de)工(gong)件(jian)表面進行精細的(de)(de)(de)(de)處(chu)(chu)理(li)，以(yi)達到(dao)平(ping)整光(guang)(guang)滑(hua)的(de)(de)(de)(de)效(xiao)果。以(yi)下(xia)(xia)是(shi)關于其(qi)用(yong)(yong)途的(de)(de)(de)(de)具體(ti)說明(ming)：1.**去除毛刺與污(wu)染物**：在(zai)制造過(guo)程中(zhong)(zhong)產生的(de)(de)(de)(de)邊角或沖(chong)壓件(jian)上的(de)(de)(de)(de)微小(xiao)凸起稱為“邊角毛剌”，這些瑕疵不(bu)僅影響美(mei)觀還可(ke)能(neng)(neng)對產品(pin)(pin)性能(neng)(neng)產生影響；通過(guo)離(li)(li)子(zi)碰撞(zhuang)的(de)(de)(de)(de)方式能(neng)(neng)有效(xiao)清除此類(lei)缺陷及雜質層的(de)(de)(de)(de)同(tong)時形成(cheng)鈍化(hua)膜(mo)以(yi)增強防(fang)腐性能(neng)(neng)。2.**提(ti)升光(guang)(guang)潔度(du)和(he)平(ping)整程度(du)**：尤其(qi)在(zai)處(chu)(chu)理(li)幾(ji)何形狀復雜的(de)(de)(de)(de)不(bu)銹鋼制品(pin)(pin)時表現(xian)突(tu)出(chu)，可(ke)將粗(cu)(cu)糙的(de)(de)(de)(de)表面逐(zhu)漸(jian)變平(ping)至粗(cu)(cu)糙度(du)為0.01μm級別并(bing)顯(xian)著提(ti)升精密(mi)度(du)；經(jing)過(guo)處(chu)(chu)理(li)后產品(pin)(pin)會變得(de)更(geng)加堅硬(ying)耐用(yong)(yong)且摩擦(ca)系(xi)數下(xia)(xia)降從而減少磨(mo)損情況的(de)(de)(de)(de)發生。3.**行業(ye)應用(yong)(yong)廣(guang)泛**:等(deng)(deng)(deng)離(li)(li)子(zi)拋光(guang)(guang)設(she)備因其(qi)率低成(cheng)本的(de)(de)(de)(de)優勢(shi)廣(guang)泛應用(yong)(yong)于手機電(dian)(dian)子(zi)、集成(cheng)電(dian)(dian)路制造業(ye)以(yi)及五金汽車(che)配件(jian)等(deng)(deng)(deng)行業(ye)之中(zhong)(zhong)，銅(tong)等(deng)(deng)(deng)離(li)(li)子(zi)拋光(guang)(guang)設(she)備廠家，特別適用(yong)(yong)于高精密(mi)零件(jian)的(de)(de)(de)(de)拋光(guang)(guang)需求例如航天器發動機葉片或者筆(bi)記本電(dian)(dian)腦硬(ying)盤組件(jian)等(deng)(deng)(deng)的(de)(de)(de)(de)表面處(chu)(chu)理(li)上，可(ke)以(yi)顯(xian)著提(ti)高工(gong)件(jian)的(de)(de)(de)(de)耐磨(mo)性和(he)導(dao)電(dian)(dian)性等(deng)(deng)(deng)特性增加附加值。綜上所述，作為一種的(de)(de)(de)(de)表面處(chu)(chu)理(li)技術手段之一——“等(deng)(deng)(deng)離(li)(li)子(zi)體(ti)”的(de)(de)(de)(de)應用(yong)(yong)大大提(ti)升了(le)傳統(tong)工(gong)藝下(xia)(xia)難以(yi)達到(dao)的(de)(de)(de)(de)效(xiao)果水平(ping)并(bing)為現(xian)代制造業(ye)發展提(ti)供了(le)有力支持保障作用(yong)(yong)不(bu)容(rong)忽視！